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Summer Course at UIMP

Nowadays, no one doubts that the rights of Intellectual Property (IP) (patents, industrial designs and trademarks) have become indispensable to increase the competitiveness of enterprises instrument, assuming them, in many cases, as a fundamental tool to indicate innovation activities, technological development and intangible assets of public institutions and private companies.

Since 2006 the Spanish Patent and Trademark Office (SPTO), in collaboration with the International University Menéndez Pelayo (UIMP), organizes a Summer Course on latest trends and future challenges of Intellectual Property, with the main objective of giving know the boundaries and challenges facing industrial property in our country.

This year, in its eleventh edition, the course titled “Protecting innovations in Spain: the new patent law” and it changes with the new Law 24/2015 of 24 July, which will be addressed Patents into force on 1 April 2017. This Act equates Spanish patent law internationally and to strengthen the system of national patents, establishing a legal framework that favors the truly inventive and innovative activity, implementing a single procedure for granting that benefit legal certainty for applicants and improve the image of the Spanish Patent.

This course, which is a strategic forum for  Spanish and European Intellectual Property leaders every year, is aimed at students, small businesses, professionals, and generally anyone who is interested in approaching the Industrial Property or want to deepen certain aspects thereof.

The course will take place from 11 to 15 July at the Palacio de la Magdalena in Santander, participating in the first day Undersecretary of Industry, Energy and Tourism (and president in addition to the SPTO), the President of the European Patent Office (EPO) and the President of the European Industrial Property Office (euipo).

The registration period is opened and the deadline to apply for scholarships ends on June 13. The registration must be formalized in the UIMP.

Source: OEPM UIMP

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